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Joined 2 years ago
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Cake day: June 30th, 2023

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  • This seems about right. Progress was originally supposed to be 5-10 years. I’m not too sure on how effective these prototypes are. My guess is that their progress of EUV sources is quite far now, but that they’ll still need to have greater progress in regards to domestically created collector & debris mitigation systems, projection optics, mask blanks and other things.

    Edit Addendum: Note, article agrees with the timeline of 5 years behind for China. Since their EUV source(presumably) works differently from ASML’s LPP EUV(many think China is going LDP route for EUV source), research may still go up to 10 years, as they will likely need to account for this when researching the other components in a full scanner. Alot of significant modifications or straight up new shit will have to be made. And even then, it’ll need to be commerically viable to compete with the West.








  • My conspiracy is that people are trying to ramp up enough of a campaign to defederate from .ml, not knowing it’s history on Lemmy and how most .ml users are actually quite chill and actually genuine people once you get to know them. I mean Jesus Christ guys, .ml users arent all bots.




  • I often hear AI enthusiasts say that AI democratized art. As if art weren’t already democratized. Most anyone can pick up a pen, draw, write, type, move a mouse, etc. What AI democratizes in art, is the perception of skill. Which is why when you find out a piece of art was made by inputting some short prompt into a generator, you become disappointed. Because it would be cool, if the person actually had the skill to draw that. Pushing a few buttons to get that, not so much.

    Edit:spelling and spacing